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Thulium

Element density: 9.32 g/cm3
Electron configuration: [Xe]4f136s2
Oxidation states: +3

Thulium

Edges

Explore electron energy loss spectroscopy (EELS) reference spectra, featuring major and minor edges used for elemental identification and chemical state analysis in materials research. 
 

 

Major edges

L3

8648

 

 

M4

1515

Minor_Sharp Peak

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Major_Delayed Minimum

M5

1468

Major_Sharp Peak
Major_Delayed Minimum

N4,5

180

Major_Broad Peak
Major_Delayed Minimum

O2,3

32

Major_Broad Peak
Major_Delayed Minimum

 

Minor edges

L1

10116

 

 

L2

9617

 

 

M1

2307

 

Very Weak_Abrupt Onset

M2

2090

Intermittent_Sharp Peak
Very Weak_Delayed Minimum

M3

1885

Intermittent_Sharp Peak
Very Weak_Delayed Minimum

N1

472

 

Very Weak_Abrupt Onset

N2

386

Intermittent_Sharp Peak
Very Weak_Delayed Minimum

N3

337

Intermittent_Sharp Peak
Very Weak_Delayed Minimum

O1

53

 

Very Weak_Abrupt Onset

Considerations

Sharp M4,5-edges allow for trace analysis.

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Related spectral data

Tm2O3 thin film (0 – 380 eV)
   

Tm2O3 thin film (0 – 380 eV)

Material analyzed: Tm2O3

Related elements: Thulium, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 – 380

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; zero-loss peak intensity = 1.30e9; total elastic int. / zero-loss int. = 0.41; gain change factor = 788; 12 sweeps 20 ms dwell 

 

Tm2O3 thin film (0 – 950 eV)
   

Tm2O3 thin film (0 – 950 eV)

Material analyzed: Tm2O3

Related elements: Thulium, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 – 950

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; 23 sweeps 20 ms dwell

 

Tm2O3(1350-1860eV)
   

Tm2O3 thin film (1350 – 1860 eV)

Material analyzed: Tm2O3

Related elements: Thulium, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 1350 – 1860

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; 20 sweeps 20 ms dwell

 

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