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Aluminum

Element density: 2.70 g/cm3
Electron configuration: [Ne]3s13p1
Oxidation states: +3

Aluminum

Edges

Explore electron energy loss spectroscopy (EELS) reference spectra, featuring major and minor edges used for elemental identification and chemical state analysis in materials research.

 

 

Major edges

K

1560

 

Minor_Abrupt Onset

L2,3

73

Minor_Sharp Peak
Major_Delayed Minimum

 

 

Minor edges

L1

118

 

Minor_Abrupt Onset

Considerations

The L-edge of Al shows strong variation in ELNES especially for minerals. Its low energy often makes edge extraction problematic. A 1st order log-polynomial is often the best background model. Thin specimen (<0.5 mfp) and/or plural scattering deconvolution is often useful.


The K-edge of Al is better suited for compositions mapping and quantification, but often lies near the stay emission artifact Schottky emitters. Be sure the collection angle is sufficient.
 

The plasmon peak of Al metal is very sharp and its energy can be measured with high precision. Changes in local temperature and alloying have been be detected and quantified via the energy shift.

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Related spectral data

Al polycrystalline film (0 – 180 eV)
   

Al polycrystalline film (0 180 eV)

Material analyzed: Al

Related elements: Aluminum

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 - 180

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; 5 sweeps 16.67 ms dwell

 

Al polycrystalline film (0 – 450 eV)
   

Al polycrystalline film (0 450 eV)

Material analyzed: Al

Related elements: Aluminum

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 150

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; slightly oxidized; zero-loss peak intensity = 8.19e8; total elastic int. / zero-loss int. = 0.17; gain change = 522; 25 sweeps 20 ms dwell

 

Al polycrystalline film (0 – 3920 eV)
   

Al polycrystalline film (0 3920 eV)

Material analyzed: Al

Related elements: Aluminum

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 3920

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; slightly oxidized; 60 sweeps 10 ms dwell

 

Al2O3 thin film (0 – 180 eV)
   

Al2O3 thin film (0 – 180 eV)

Material analyzed: Al2O3

Related elements: Aluminum, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 180

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; 7 sweeps 16.67 ms dwell

 

Al2O3 thin film (0 – 450 eV)
   

Al2O3 thin film (0 – 450 eV)

Material analyzed: Al2O3

Related elements: Aluminum, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 – 450

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; zero-loss peak intensity = 7.84e8; total elastic int. / zero-loss int. = 0.18; gain change factor = 654; 20 sweeps 20 ms dwell
 

Al2O3 thin film (0 – 3910 eV)
   

Al2O3 thin film (0 – 3910 eV)

Material analyzed: Al2O3

Related elements: Aluminum, Oxygen

Data contributor: Gatan

Beam energy (keV): 200

Nominal energy range (eV): 0 – 3910

Collection semi-angle effective (mrad): 100

 

Notes: Serial EELS; zero-loss peak intensity = 7.33e9; total elastic int. / zero-loss int. = 0.18; gain change factor = 401; 100 sweeps 10 ms dwell
 

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